ECE 510 - Micro and Nanolithography

Official Description

Comprehensive foundation in the broad field of micro and nanolithography; the science of optical imaging, photochemistry, and materials issues; technological developments including state-of-the-art commercial lithography systems. Applications of micro and nanolithography to diverse fields including: semiconductor devices, displays, flexible electronics, microelectromechanical systems, and biotechnology. Course Information: Prerequisite: One of ECE 444, ECE 460, MSE 462, NPRE 429, PHYS 402.

Subject Area

Microelectronics and Photonics

Course Director

Description

This course provides a comprehensive foundation in the broad field of micro/nanolithography for graduate students in varied research areas. Lithography is the central process technology used in fabrication of a vast array of micro/nano structures required in microelectronic devices, displays, flexible electronics, microelectromechanical systems, and biotechnology. The course covers the science of microlithography, including optical imaging, photochemistry, and materials issues; the extensive technological developments, including state-of-the-art commercial lithography systems; and the innumerable applications of lithography in diverse fields.

Topics

  • Evolution of microelectronic devices; critical role of lithography.
  • Fundamental elements and attributes of microlithographic processes.
  • Types of microlithography; optical, e-beam, X-ray, EUV, nanoimprint.
  • Excimer lasers as dominant sources for lithography. Key features.
  • Optical projection lithography. Primary concepts. Steppers and scanners.
  • Lithography on flexible substrates. Roll-to-roll lithography.
  • Photoresists. Main constituents and functions. Performance parameters.
  • Resolution enhancement techniques. Phase shift masks. Immersion lithography.
  • Maskless lithography. Spatial light modulators. Biotechnology applications.
  • Electron-beam lithography. Electron Sources. Resists. Exposure concepts.
  • X-ray lithography. X-ray sources, synchrotron. Masks. Resists. Applications.
  • Extreme ultraviolet (EUV) lithography. Sources, masks, resists Challenges.
  • Nanoimprint lithography. Basic concepts. Limitations. Applications.
  • UV laser photoablation. Photochemistry. Ablation systems. Key applications.

Detailed Description and Outline

Topics:

  • Evolution of microelectronic devices; critical role of lithography.
  • Fundamental elements and attributes of microlithographic processes.
  • Types of microlithography; optical, e-beam, X-ray, EUV, nanoimprint.
  • Excimer lasers as dominant sources for lithography. Key features.
  • Optical projection lithography. Primary concepts. Steppers and scanners.
  • Lithography on flexible substrates. Roll-to-roll lithography.
  • Photoresists. Main constituents and functions. Performance parameters.
  • Resolution enhancement techniques. Phase shift masks. Immersion lithography.
  • Maskless lithography. Spatial light modulators. Biotechnology applications.
  • Electron-beam lithography. Electron Sources. Resists. Exposure concepts.
  • X-ray lithography. X-ray sources, synchrotron. Masks. Resists. Applications.
  • Extreme ultraviolet (EUV) lithography. Sources, masks, resists Challenges.
  • Nanoimprint lithography. Basic concepts. Limitations. Applications.
  • UV laser photoablation. Photochemistry. Ablation systems. Key applications.

Texts

Chapters from several books, numerous journal articles, proceedings of conferences, and industry reports

Last updated

2/13/2013