ECE 510 - Micro and Nanolithography

Official Description

Comprehensive foundation in the broad field of micro and nanolithography; the science of optical imaging, photochemistry, and materials issues; technological developments including state-of-the-art commercial lithography systems. Applications of micro and nanolithography to diverse fields including: semiconductor devices, displays, flexible electronics, microelectromechanical systems, and biotechnology. Course Information: Prerequisite: One of ECE 444, ECE 460, MSE 462, NPRE 429, PHYS 402.

Prerequisites

Credit in ECE 444 or ECE 460 or MSE 462 or NPRE 429 or PHYS 402

Subject Area

Microelectronics and Photonics

Course Directors

Description

This course provides a comprehensive foundation in the broad field of micro/nanolithography for graduate students in varied research areas. Lithography is the central process technology used in fabrication of a vast array of micro/nano structures required in microelectronic devices, displays, flexible electronics, microelectromechanical systems, and biotechnology. The course covers the science of microlithography, including optical imaging, photochemistry, and materials issues; the extensive technological developments, including state-of-the-art commercial lithography systems; and the innumerable applications of lithography in diverse fields.

Topics

  • Evolution of microelectronic devices; critical role of lithography.
  • Fundamental elements and attributes of microlithographic processes.
  • Types of microlithography; optical, e-beam, X-ray, EUV, nanoimprint.
  • Excimer lasers as dominant sources for lithography. Key features.
  • Optical projection lithography. Primary concepts. Steppers and scanners.
  • Lithography on flexible substrates. Roll-to-roll lithography.
  • Photoresists. Main constituents and functions. Performance parameters.
  • Resolution enhancement techniques. Phase shift masks. Immersion lithography.
  • Maskless lithography. Spatial light modulators. Biotechnology applications.
  • Electron-beam lithography. Electron Sources. Resists. Exposure concepts.
  • X-ray lithography. X-ray sources, synchrotron. Masks. Resists. Applications.
  • Extreme ultraviolet (EUV) lithography. Sources, masks, resists Challenges.
  • Nanoimprint lithography. Basic concepts. Limitations. Applications.
  • UV laser photoablation. Photochemistry. Ablation systems. Key applications.

Detailed Description and Outline

Topics:

  • Evolution of microelectronic devices; critical role of lithography.
  • Fundamental elements and attributes of microlithographic processes.
  • Types of microlithography; optical, e-beam, X-ray, EUV, nanoimprint.
  • Excimer lasers as dominant sources for lithography. Key features.
  • Optical projection lithography. Primary concepts. Steppers and scanners.
  • Lithography on flexible substrates. Roll-to-roll lithography.
  • Photoresists. Main constituents and functions. Performance parameters.
  • Resolution enhancement techniques. Phase shift masks. Immersion lithography.
  • Maskless lithography. Spatial light modulators. Biotechnology applications.
  • Electron-beam lithography. Electron Sources. Resists. Exposure concepts.
  • X-ray lithography. X-ray sources, synchrotron. Masks. Resists. Applications.
  • Extreme ultraviolet (EUV) lithography. Sources, masks, resists Challenges.
  • Nanoimprint lithography. Basic concepts. Limitations. Applications.
  • UV laser photoablation. Photochemistry. Ablation systems. Key applications.

Texts

Chapters from several books, numerous journal articles, proceedings of conferences, and industry reports

Last updated

2/13/2013