ECE 510
Micro and Nanolithography

Displaying course information from Fall 2013.

Section Type Times Days Location Instructor
A LEC 1100 - 1220 T R   57 Everitt Lab  Kanti Jain
Web Page http://pmml.ece.illinois.edu/510-web.html
Official Description Comprehensive foundation in the broad field of micro and nanolithography; the science of optical imaging, photochemistry, and materials issues; technological developments including state-of-the-art commercial lithography systems. Applications of micro and nanolithography to diverse fields including: semiconductor devices, displays, flexible electronics, microelectromechanical systems, and biotechnology. Course Information: Prerequisite: One of ECE 444, ECE 460, MSE 462, NPRE 429, PHYS 402.
Subject Area Microelectronics and Photonics
Course Prerequisites Credit in ECE 444 or ECE 460 or MSE 462 or NPRE 429 or PHYS 402
Course Directors Kanti Jain
Detailed Description and Outline

Topics:

  • Evolution of microelectronic devices; critical role of lithography.
  • Fundamental elements and attributes of microlithographic processes.
  • Types of microlithography; optical, e-beam, X-ray, EUV, nanoimprint.
  • Excimer lasers as dominant sources for lithography. Key features.
  • Optical projection lithography. Primary concepts. Steppers and scanners.
  • Lithography on flexible substrates. Roll-to-roll lithography.
  • Photoresists. Main constituents and functions. Performance parameters.
  • Resolution enhancement techniques. Phase shift masks. Immersion lithography.
  • Maskless lithography. Spatial light modulators. Biotechnology applications.
  • Electron-beam lithography. Electron Sources. Resists. Exposure concepts.
  • X-ray lithography. X-ray sources, synchrotron. Masks. Resists. Applications.
  • Extreme ultraviolet (EUV) lithography. Sources, masks, resists Challenges.
  • Nanoimprint lithography. Basic concepts. Limitations. Applications.
  • UV laser photoablation. Photochemistry. Ablation systems. Key applications.
Texts
Chapters from several books, numerous journal articles, proceedings of conferences, and industry reports
Last updated: 2/13/2013