Gaseous Electronics and Plasmas
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Displaying course information from Spring 2014.
||1230 - 1350
|| T R
||106B6 Engineering Hall
||Basic concepts and techniques, both theoretical and experimental, applicable to gaseous electronics, gas and solid plasmas, controlled fusion, aeronomy, gas lasers, and magnetohydrodynamics. Course Information: Prerequisite: ECE 452 or PHYS 485.
||Microelectronics and Photonics
||Credit in ECE 452
Credit in PHYS 485
James Gary Eden
|Detailed Description and Outline
- Introduction: Basic concepts of plasmas and gaseous electronics, the dc discharge, cathode phenomena, negative glow, positive column
- Elementary theory of gas discharges: Langevin equation; simple theory of conductivity, mobility and diffusion; equations of continuity, momentum conservation and energy conservation; energy balance, electron temperature and energy relaxation
- Collisional and relaxation mechanisms: Elastic and inelastic cross sections and collision frequencies; electron-molecule scattering
- Boltzmann equation: Electron energy distributions in weak and strong fields (Maxwellian, Druyvesteyn); comparison of exact and approximate theories and calculation of transport coefficients for model and practical cases; computer solutions
- Rate processes in gas discharges: Ionization, diffusion, attachment, recombination; application to positive column theory; rate equations, equilibrium, and transient properties of gas discharges, ambipolar diffusion
- Physics of the sheath
- Diagnostics: Langmuir probes, interferometry, Thompson scattering
- Plasma processing: Radio frequency (rf), microwave, electron cyclotron resonance and inductively coupled plasma systems, ion energy distributions, etching and deposition mechanisms
- Lasers and high-pressure devices; example of the CO2 laser
- Modeling of practical discharge systems
M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Displays and Materials Processing, 2nd ed., John Wiley & Sons, 2005.
Last updated: 2/13/2013