Faculty
Kanti Jain
Professor
132 Everitt Lab, MC-702
1406 W. Green
Urbana, Illinois 61801
(217) 333-5990
Ph.D. -- UIUC, ECE/Physics, 1975.
Research Statement:
The central theme in our research programs is to advance the state-of-the-art in microelectronic, optoelectronic and microsystem devices by developing and exploiting novel micro/nano-fabrication technologies. These fabrication technologies enable patterning and microstructuring of a variety of organic and inorganic materials -- including new polymers, semiconductors, metals, dielectrics and biological materials -- and producing structures, devices and systems previously not deemed possible. Examples of such devices and systems that are our research objectives include integrated, distributed, multifunctional sensors, antennas and electronic modules produced on flexible substrates using novel large-area fabrication techniques. To realize cost-effective fabrication of such devices that will make their implementation in a variety of scientific, commercial and military applications practical, we are developing the necessary combination of novel structures, materials and processes, such as high-resolution, conformable lithography on nonplanar surfaces; excimer laser photoablation in a variety of materials; laser processing of semiconductor films to create active devices; large-area lithography for flat and flexible displays; massively parallel maskless nanolithography; microfluidic devices and biomolecular arrays; and optoelectronics, micro-optics and photonic circuits.
Teaching Statement:
Professor Jain teaches a graduate-level in-depth course on Micro/Nanolithography, offered in the Fall, and a senior undergraduate/graduate-level course covering the broad scope of advanced microelectronic process technologies, offered in the Spring.
Research Interests:
- Energy-smart buildings: Optoelectronic envelope technologies for energy efficiency and recycling
- Excimer laser processing technologies for fabrication of displays and microelectronics
- Smart skins: Large-area, integrated, distributed, multifunctional sensors on flexible substrates
- Ultra-high-resolution lithography technologies for nanoscale devices
- Optoelectronics, micro-optics, and photonic circuits
- Micro and nano fabrication technologies
For more information:
Photonics, Microelectronics, and Microsystems Laboratory
Honors, Recognition, and Outstanding Achievements
- Elected to the National Academy of Engineering, 2009, for (as cited): Contributions to the development of high-resolution, deep-ultraviolet excimer lithography for microelectronic fabrication.
- Recipient of the 2008 David Richardson Medal of the Optical Society of America for (as cited): Pioneering contributions to the development of high-resolution optical microlithography technologies, especially for the invention and development of excimer laser lithography and systems for production of microelectronic devices.
- Fellow of IEEE, 2005.
- Fellow of Optical Society of America, 1999.
- Founding Member, Department of Physics Advisory Board, UIUC, 1998-2002.
- Fellow of SPIE, 1993.
- Founder and President of Anvik Corporation, a microelectronics manufacturing systems company; obtained $21 million in external funding.
- Outstanding Innovation Awards by IBM for invention and development of excimer laser lithography, used worldwide for semiconductor chip production, 1985, 1988.
- Holder of 69 patents (54 issued/allowed, 15 pending), including inventions of core lithography technologies for production of ICs and displays.
- Member of the Board of Directors of SPIE, 1992-94.
- Member of the Executive Committee of the Board of Directors of SPIE, 1992, 93.
- SPIE Editor of Microlithography World, a publication of Pennwell Publishing Company in collaboration with SPIE, 1992-2004.
- SPIE Publications Committee Chair, 1992, 93.
Honors, Recognition, and Outstanding Achievements for Teaching
- Created a new graduate-level course, ECE 510, Micro/Nanolithography: Science, Technology, and Applications. Provides a comprehensive foundation in the broad field of lithography, the central process technology critical to the fabrication of a vast array of micro/nano structures required in microelectronic devices, displays, flexible electronics, microelectromechanical systems, and biotechnology.